Product details

Material: W1

Type: Plane target, Rotary target

Shape: Tube, Square, Round, Oblong

Purity: 99.95%, 99.97%

Conventional density: 19.0g/cm3 ~ 19.2g/cm3

High density: >19.2 g/cm3

Size: Customized

Product characteristics:

-- High density

-- High purity,

-- Fine grain

Applications:

Sputtering target materials are used for magnetron sputtering coating. Sputtering coating is one of the main methods of physical vapor deposition (PVD), which is used to deposit thin films with certain special functions on the surface.Sputtering target materials are mainly used in plate display coating, semiconductor coating, glass coating, solar cell coating, decorative coating and other industries.

Process flow:

Plane target:

Powder-- Pressing-- Sintering-- HIP-- Deep processing-- Surface treatment--

Finished products-- Inspection-- Packing

Small rotary target:

Powder--Pressing--Sintering--Forging--Deep processing--Surface treatment--Finished

products--Inspection--Packing

Large rotary target:

Powder-- Pressing--Sintering--Deep processing--Surface treatment--Finished products --Inspection--Packing

HIP Process

Hot isostatic pressing (HIP) is a kind of production technology integrating high temperature and high pressure. The heating temperature is usually 1000 ~2000°C, and the working pressure can reach 200MPa by using high pressure inert gas or nitrogen in a sealed container as the pressure transmission medium. Under the joint action of high temperature and high pressure, the workpiece is evenly pressed in all directions. Therefore, processed products have high density, good uniformity and excellent performance. At the same time, the technology has the characteristics of short production cycle, less working procedure, low energy consumption and low material loss.

Advantages of HIP technology in producing targets:

--Eliminating the porosity

--Improving mechanical properties,

--Extending the service life of the product

--Making grain structure Finer and more uniform

--Improving the surface quality of machining

Chenjun Tungsten & Molybdenum Co., LTD. can provide the following high quality target:

W target, Mo target, MoNb target, Nb target, Cr target, Ti target,Ta target